HISTORY

1977 April

Established as Clean Surface Technology Co., Ltd. with capital of 24 million yen

September

No. 1 Kurami Plant, Samukawa-machi.

November

Relocated the Head Office to the above site.
Commenced the manufacture and sale of mask blanks.

1978 February

Commenced the manufacture and sale of plates for CF video camera imaging tubes.

November

Completed construction of the No. 2 Kurami Plant, establishing a monthly production capacity of 20,000 units.

1982 February

Acquired an industrial site (16,529 m2) on the Esashi Chukaku Industrial Park (Iwate).

August

Commenced the development, manufacture and sale of T-67 dry/wet mask blanks.

1983 November

Completed construction on the No. 1 Esashi Plant in Esashi City, Iwate.

1984 January

Started production and shipments at the No. 1 Esashi Plant.

August

Acquired an industrial site in Omagari, Samukawa-machi, Koza-gun, Kanagawa.

1985 April

Commenced the manufacture and sale of handling jigs.

1988 November

Completed construction on the main plant in Samukawa-machi, Koza-gun, Kanagawa.

1989 February

Developed a small-scale sputtering device, and switched from vapor deposition to sputter film.

1990 October

Commenced the manufacture and sale of large mask blanks.

1992 September

Commenced the manufacture and sale of low reflection BM blanks.

1993 November

Entered into a joint development agreement with Rockwell International for the development of ultra-low reflection BMs.

1994 June

Completed development of ultra-low reflection BMs, and commenced manufacturing and sales.

November

Completed construction on the No. 2 Esashi Plant, and began full-scale production of low reflection BM blanks.

1996 April

Commenced the manufacture and sale of 620x720 large quartz mask blanks for LCDs.

1997 October

Completed construction on the No. 3 Esashi Plant, and began shipping 700x800 large quartz mask blanks.

1999 December

Commenced the manufacture and sale of handling jigs for large boards.

2000 December

Completed construction of the Head Plant Mask Building.

2002 May

Commenced production of halftone films

2003 March

Completed construction of the Esashi Mask Building, allowing support for 1350x2100 size products.

August

Acquired ISO9001 certification.

2004 May

Awarded as a corporation with exemplary tax returns.

2005 July

Completed construction of the Head Office East Building, and commenced manufacture and sale with support for G8 LCD.

2006 January

Halftone film enter full-scale production.

2008 August

Completed construction of the Esashi Main Building, and commenced manufacture and sale with support for G10 LCD.

December

Commenced the manufacture and sale of 2100x2500 mask blanks.

2011 October

Completed development of the ultra-fine mask ZF11, and commenced manufacturing and sales.

2014 April

Transitioned to the management structure of the Polaris Capital Group Co., Ltd.

2017 February

Transitioned to become a subsidiary of Mitsui Matsushima Co., Ltd. (currently, Mitsui Matsushima Holdings Co., Ltd.) (Tokyo Stock Exchange Prime, Fukuoka Stock Exchange).

2022 September

Established a dedicated production line for thick film resist blanks.

2023 April

Changed name to CST Co., Ltd.