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CST Clean Surface Technology Co.

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Film Type
Mark
Type

C
Single chrome type

C


Mark
Type

L
Low reflective

L

ZF11
CST has developed a new type of film for high definition mask with flatness change of the membrane stress state that is closer to zero.
The feature is as follows;

1) Pattern cross-section shape right smooth tapered with little "side-etching" so as to easily generate a sub-micron pattern.
2) Raising of particle during sputtering Reduced, and half-pinhole defect decreased by two digits in comparison to the earlier standard.
3) Flatness change before & after sputtering limited to less than 1/5 of earlier standard, and even made possible to zero.
4) Membrane composition altered to limit possibility for defects, thus being able to reduce the amount of erosion that can penetrate through scratches on the plate.

[to reference]
* Etching character of ZF11
* Time of additional etching and loss volume of pattern-width

ZF11; Improvement of pattern cross-section
CST establish the way of deposition, which controls pattern cross-section shape, not only to be up right sharpness but to be smooth right tapered with its angle.
There will have little effect on the cross-section shape even after adding etching time, and thus keep the best performance against "side etching".

[to reference]
* ZF11; SEM photo

Smallest change of flatness before and after coating ZF11
ZF11 realizes the flatness change close to almost zero with the least effect on the substrate.
Generally, Chrome film force itself to shrink compare to Chrome oxide film itself grow extend, in such a way as to reduce the chrome stress with the balance of Chrome oxide reaction.

[to reference]
* Flatness change with CS8 (1220×1400×13t)
* ZF11 Flatness change with CS8 (1220×1400×13t)
* Flatness change with 800×920×8t

ZF11
Conventional products have many half-pinhole while they have less pinholes. However, the result of in-house testing half-pinhole with ZF11 says that the quantity of half-pinhole over 2µm decreased by 1/10 to 1/100 ompare to the conventional film type.





Mark
Type

LP
Low reflective (Navy blue sufface)

LP


Mark
Type

T
Both sides, Low reflective (Gold brown)

T


Mark
Type

M
Both sides, Low reflective (backside Navy blue)

M


Mark
Type

MP
Both sides, Low reflective (bothside Navy blue)

MP



Half-tone, Flat half-tone film
CST's half-tone film (Top type half-tone mask ) has been practically used since 2002 and meet a wide variety of customers' needs and more than 2,300 pcs.

[to reference] * HT type and FHT type

[Plate sizes]
6025〜G8 (1220×1400) G10 is available

[Spacification]
 
HT type
FHT type
 

Transmission
30 ~ 70%
10 ~ 40%
Specified by customer

Avarage
± 1%
± 1%
target

Range
1% and below
1% and below
target


[Example of transmission uniformity]

Plate size : G8 (1220×1400mm)
Transmisson : g-line 16.5%
Average
16.5

Range
1.3

Max
17.3

Min
16.1


mm
50
150
250
350
450
550
650
750
850
950
1050
1150
1250
1350

50
16.8
16.5
16.4
16.3
16.3
16.4
16.3
16.3
16.4
16.4
16.4
16.5
16.5
16.7

150
16.7
16.4
16.3
16.2
16.2
16.2
16.2
16.2
16.2
16.2
16.3
16.4
16.4
16.6

250
17.1
16.8
16.6
16.6
16.5
16.5
16.5
16.5
16.5
16.6
16.6
16.8
16.8
17.1

350
17.0
16.7
16.5
16.5
16.4
16.4
16.4
16.3
16.4
16.4
16.5
16.7
16.7
17.0

455
16.9
16.6
16.4
16.2
16.2
16.2
16.1
16.1
16.1
16.2
16.3
16.5
16.6
16.9

560
17.1
16.7
16.5
16.4
16.3
16.3
16.2
16.2
16.2
16.3
16.4
16.6
16.7
17.0

660
17.1
16.7
16.5
16.4
16.3
16.2
16.2
16.2
16.2
16.3
16.4
16.5
16.6
16.9

765
17.0
16.6
16.4
16.3
16.2
16.2
16.2
16.1
16.2
16.2
16.3
16.5
16.6
16.9

865
17.3
17.0
16.8
16.7
16.6
16.5
16.5
16.5
16.5
16.5
16.6
16.8
16.8
17.0

970
17.3
17.0
16.8
16.7
16.6
16.5
16.5
16.5
16.5
16.5
16.6
16.7
16.8
17.0

1070
16.9
16.6
16.4
16.3
16.2
16.2
16.1
16.1
16.1
16.1
16.2
16.3
16.3
16.5

1170
17.0
16.8
16.6
16.4
16.4
16.4
16.2
16.2
16.3
16.2
16.3
16.5
16.5
16.6



[to reference] * Top type / Bottom type half-tone mask


EP (Electrostatic Preventing) Blanks
CST supports EP blanks to be available for larger size up to 1300×2100(5t) and 1220×1400(13t) from November 2013.

EP meets the requirements of the following condition as an electrostatic preventing blanks.

  1. 1. Non-etched when Cr (light shield film) is stched.
  2. 2. Covers necessary transmission when exposed.
  3. 3. Defect-less (PH/Dark PH) when coating.
  4. 4. High adhesive performance along with Cr & glass.
  5. 5. Long-term retention of conductivity.
  6. 6. Excellent in chemical proof (resistance to chemical during mask cleaning).

Anti-static EP's chamical proof
Soak in a Cr etchant: 5min
result
OK

Soak in a H2SO4: 1hour
result
OK

Soak in a HNO3: 1hour
result
OK

Soak in a 25% NaOH: 1hour
result
OK



Membrane composition of EP blanks






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